| IN EML | ||
| MACHINE NAME | IT DOES: | AREA: |
ALD  |
Atomic layer deposition | vacuum deposition |
| asher | plasma PR stripper | |
| dektak | mechanical surface profilometer | |
| ebeam-AJA |
e-beam evaporator | deposition |
| ma-4 | mask alignment, UV exposure of photo resist | |
| OxidationTube |
CMOS oxidation furnace | diffusion |
| plasmatherm | PECVD-RIE | plasma etch |
| RTA-EML |
rapid thermal processing | |
| sputtererAJA |
thin film deposition | |
| anneal-furnace |
tube anneal furnace | diffusion |
| vac-oven |
Up to 600C in 10mT vacuum or N2 purge. | diffusion |