CORAL Name: | tubeB4-Poly |
Model Number: | MRL Low Pressure Chemical Vapor Deposition Polysilicon Reactor |
Location: | TRL |
What it does: | atmospheric diffusion tube |
Introduction: | MRL Industries’ reactor in TRL is a low-pressure chemical vapor deposition system designed to deposit polycrystalline thin films on 6-inch silicon wafers. Polycrystalline silicon is deposited Using silane (SiH4) at low pressure (200-300milliTorr) and in the temperature range of 560 – 630°C. Operating at low pressure, the mean free path of the reactant
gases increases. This assures a high uniformity of the deposited
film thickness, but as a result decreases the deposition
rate.
The time to achieve a specific thickness could be extrapolated or interpolated as long as the process runs in the “reaction rate limited regime”. The Semy controller runs the furnace operation. The Semy software does not allow for variable time input, so a recipe has been created for each thickness level based on the above mentioned deposition rate. The low-pressure level during operation is maintained by a MKS vacuum controller, which commands a throttle valve according to the set points established by the Semy controller.
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Safety: | Silane – SiH4 is a very flammable gas in contact with Oxygen. It is a pyrophoric material. The Material Safety Data Sheet (MSDS for Silane can be found in the yellow MSDS binders in the copier room of building 39) The reactor is equipped with safety interlocks at both
the hardware and software level to minimize Silane related
hazardous events. |
Procedure: |
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Author: | Bernard Alamariu, Brian McKenna, 2/03 |