Fabrication Technologies
- Alternative Chemistries for Wafer
Patterning
- Scanning-Electron-Beam Lithography
- Spatial-Phase-Locked Electron-Beam
Lithography
- Search for an Optimal Scintillation
System for Spatial Phase Locked E-beam Lithography
- X-ray Nanolithography
- Improved Mask Technology for X-ray
Lithography
- Nanometer-level Feedback-Stabilized
Interferometric Aligning and Gapping X-ray Exposure System
- Zone-Plate-Array Lithography (ZPAL)
and Microscopy (ZPAM)
- Fabricating Advanced Microsystems
with Conformable-Contact Photolithography
- Interference Lithography
- Interference Lithography for
Patterning Variable-Period Gratings
- Nanometrology Using Interferometrically-Patterned
Fiducial Grids
- Technologies for 3D Devices and
Circuits Through Wafer Bonding with Submicron Alignment Accuracy
- A Silicon Substrate-Via Technology
with High Aspect Ratio
- A Faraday Cage Structure for Substrate
Crosstalk Isolation
- Selective Self-Organization
of Colloidal Particles
- Polymeric Fluorocarbon Films via
Hot-Filament Chemical Vapor Deposition
- Hot Filament Chemical Vapor
Deposition of Polyoxymethylene as a Sacrificial Layer for Fabricating Air Gaps
- Three-dimensional Integration
of GaAs and Si Circuitry Using Low Temperature Oxide Bonding Techniques
- Magnetically Assisted Self Assembly – A
New Heterogeneous Integration Technique
- Solid State Solvation Effect
- Diffusion and Activation
of Arsenic in Silicon Germanium Alloys