Mark L. Schattenburg
Collaborators
- H.I. Smith, MIT
- D. Smith, PGL
- D. Trumper, MIT
- R. Hocken, UNCC
Graduate Students
- A. Bruccoleri, Research Asst., Aero/Astro
- J. Fucetola, Research Asst., ME
- A. Al-Husseini, Research Asst., ME
- S. Slater, Research Asst., Physics (Harvard)
- M. Hyers, Research Asst., ME
Support Staff
- P. Mukherjee, Postoc
- R. Heilmann, Lab Assoc. Director
Publications
“High fidelity blazed grating replication using nanoimprint lithography,” C.-H. Chang, J.C. Montoya, M. Akilian, A. Lapsa, R.K. Heilmann, M.L. Schattenburg, M. Li, K.A. Flanagan, A.P. Rasmussen, J.F. Seely, J.M. Laming, B. Kjornrattanawanich and L.I. Goray, J. Vac. Sci. Technol. B 22, 3260- 3264 (2004).
“Doppler writing and linewidth control for scanning beam interference lithography,” J. Montoya, C.-H. Chang, R.K. Heilmann and M.L. Schattenburg, J. Vac. Sci. Technol. B 23, 2640-2645 (2005).
“Describing isotropic and anisotropic out-of-plane deformations in thin cubic materials using Zernike polynomials,” C.-H. Chang, M. Akilian and M.L. Schattenburg, Applied Optics 45, 432-437 (2006).
“Near-normal-incidence extreme-ultraviolet efficiency of a flat crystalline anisotropically etched blazed grating,” M.P. Kowalski, R.K. Heilmann, M.L. Schattenburg, C.-H. Chang, F.B. Berendse and W.R. Hunter, Applied Optics 45, 1676-1679 (2006).
“Efficiency of a grazing-incidence off-plane grating in the soft x-ray region,” J.F. Seely, L.I. Goray, B. Kjornrattanawanich, J.M. Laming, G.E. Holland, K.A. Flanagan, R.K. Heilmann, C.-H. Chang, M.L. Schattenburg and A.P. Rasmussen, Applied Optics 45, 1680-1687 (2006).
“Phase control in multiexposure spatial frequency multiplication,” Y. Zhao, C.-H. Chang, R.K. Heilmann and M.L. Schattenburg, J. Vac. Sci. Technol. B 25, 2439-2443 (2007).
“Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers,” M. Ahn, R.K. Heilmann and M. L. Schattenburg, J. Vac. Sci. Technol. B 25, 2593-2597 (2007).
“Spectrometer concept and design for x-ray astronomy using a blazed transmission grating,” K. Flanagan, M. Ahn, J. Davis, R. Heilmann, D. Huenemoerder, A. Levine, H. Marshall, G. Prigozhin, A. Rasmussen, G. Ricker, M. Schattenburg, N. Schulz and Y. Zhao, Proc. SPIE 6686, Optics for EUV, X-Ray, and Gamma-Ray Astronomy III, eds. S.L. O’Dell and G. Pareschi, pp. 66880Y-1-12 (2007).
“Design of a double-pass shear mode acousto-optical modulator,” C.-H. Chang, R.K. Heilmann, M.L. Schattenburg and P. Glenn, Rev. Sci. Instr. 79, pp. 033104-1-5 (2008).
“Fabrication of 50 nm-period gratings with multilevel interference lithography,” C.-H. Chang, Y. Zhao, R.K. Heilmann and M.L. Schattenburg, Opt. Lett. 33, 1572-1574 (2008).
“Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers,” M. Ahn, R.K. Heilmann and M.L. Schattenburg, J. Vac. Sci. Technol. B 26, 2179-2182 (2008).
“Spatial-frequency multiplication with multilayer interference lithography,” C.-H. Chang, Y. Zhao, R.K. Heilmann and M.L. Schattenburg, J. Vac. Sci. Technol. B 26, 2135-2138 (2008).
“5000 groove/mm multilayer-coated blazed grating with 33% efficiency in the 3rd order in the EUV wavelength range,” D.L. Voronov, E.H. Anderson, R. Cambie, F. Salmassi, E.M. Gullikson, V.V. Yashchuk, H.A. Padmore, M. Ahn, C. Chang, R.K. Heilmann and M.L. Schattenburg, in Advances in X-Ray/EUV Optics and Components IV, edited by A.M. Khounsary, C. Morawe, S. Goto, Proc. SPIE 7448 (SPIE, Bellingham, WA) 74480J-1-11 (2009).
“Optimization and temperature mapping of an ultra-high thermal stability environmental enclosure,” Y. Zhao, D.L. Trumper, R.K. Heilmann and M.L. Schattenburg, J. Precision Engineering 34, 164–170 (2010).