Karl K. Berggren
Collaborators
- M. Baldo, MIT
- M. Bawendi, MIT
- V. Bulovic, MIT
- E. Dauler, Lincoln Laboratory
- S. Hamilton, Lincoln Laboratory
- D. Joy, ORNL
- A.J. Kerman, Lincoln Laboratory
- K. Kim, Seoul National U.
- R. Molnar, Lincoln Laboratory
- D. Oates, Lincoln Laboratory
- M. Postek, NIST
- M. Rooks, Yale
- C. Ross, MIT
- E. Thomas, MIT
- A. Vladar, NIST
- W. Wu, HP
- Q. Xia, HP
Visiting Faculty
- R. Peterson, U. of The South
- M. Csete, U. of Szeged
- S. Warisawaa, U. of Tokyo
Postdoctoral Associates
- F. Marsili, EECS
- S. Schulz, EECS
- S. Strobel, EECS
- J. Yang, EECS
Graduate Students
- A. McCaughan, Res. Asst., EECS
- C. Herder, Res. Asst., EECS
- M. Snella, EECS
- D. Meyer, Res. Asst., EECS
- H. Korre, Res. Asst., EECS
- J-B. Chang, Res. Asst., DMSE
- X. Hu, Res. Asst., EECS
- J. Leu, Res. Asst., EECS
- D. Winston, Res. Asst., EECS
Undergraduate Students
- D. Aude, UROP
- V. Ramasesh, UROP
- K. Harry, U. of Kansas
- C. Kirkendal, U. of Missouri
Visiting Students
- L. Battistella, Politecnico di Torino
- F. Bellei, Politecnico di Torino
- H. Duan, Lanzhou University
- F. Najafi, TUM
Support Staff
- A. Akins, Administrative Assistant
- J. Daley, Project Technician, NSL
- M. Mondol, Facility Manager,SEBL
Publications
J. K. W. Yang, A. J. Kerman, E. A. Dauler, B. Cord, V. Anant, R. J. Molnar, and K. K. Berggren, “Suppressed Critical Current in Superconducting Nanowire Single-Photon Detectors With High Fill-Factors,” IEEE Transactions on Applied Superconductivity, vol. 19, pp. 318-322, 2009.
X. L. Hu, C. W. Holzwarth, D. Masciarelli, E. A. Dauler, and K. K. Berggren, “Efficiently Coupling Light to Superconducting Nanowire Single-Photon Detectors,” IEEE Transactions on Applied Superconductivity, vol. 19, pp. 336-340, 2009.
A. J. Kerman, J. K. W. Yang, R. J. Molnar, E. A. Dauler, and K. K. Berggren, “Electrothermal feedback in superconducting nanowire single-photon detectors,” Physical Review B, vol. 79, p. 100509, 2009.
X. L. Hu, T. Zhong, J. E. White, E. A. Dauler, F. Najafi, C. H. Herder, F. N. C. Wong, and K. K. Berggren, “Fiber-coupled nanowire photon counter at 1550 nm with 24% system detection efficiency,” Optics Letters, vol. 34, pp. 3607-3609, 2009.
B. Cord, J. Yang, H. G. Duan, D. C. Joy, J. Klingfus, and K. K. Berggren, “Limiting factors in sub-10 nm scanning-electron-beam lithography,” Journal of Vacuum Science & Technology B, vol. 27, pp. 2616-2621, 2009.
D. Morecroft, J. K. W. Yang, S. Schuster, K. K. Berggren, Q. F. Xia, W. Wu, and R. S. Williams, “Sub-15-nm nanoimprint molds and pattern transfer,” Journal of Vacuum Science & Technology B, vol. 27, pp. 2837-2840, 2009.
J. K. W. Yang, B. Cord, H. G. Duan, K. K. Berggren, J. Klingfus, S. W. Nam, K. B. Kim, and M. J. Rooks, “Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography,” Journal of Vacuum Science & Technology B, vol. 27, pp. 2622-2627, 2009.
D. Winston, B. M. Cord, B. Ming, D. C. Bell, W. F. DiNatale, L. A. Stern, A. E. Vladar, M. T. Postek, M. K. Mondol, J. K. W. Yang, and K. K. Berggren, “Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist,” Journal of Vacuum Science & Technology B, vol. 27, pp. 2702-2706, 2009.
C. P. Fucetola, H. Korre, and K. K. Berggren, “Low-cost interference lithography,” Journal of Vacuum Science & Technology B, vol. 27, pp. 2958-2961, 2009.
S. W. Nam, M. J. Rooks, J. K. W. Yang, K. K. Berggren, H. M. Kim, M. H. Lee, K. B. Kim, J. H. Sim, and D. Y. Yoon, “Contrast enhancement behavior of hydrogen silsesquioxane in a salty developer,” Journal of Vacuum Science & Technology B, vol. 27, pp. 2635-2639, 2009.
Y. S. Jung, J. B. Chang, E. Verploegen, K. K. Berggren, and C. A. Ross, “A Path to Ultranarrow Patterns Using Self-Assembled Lithography,” Nano Letters, vol. 10, pp. 1000-1005, 2010.
J. K. W. Yang, Y. S. Jung, J. B. Chang, R. A. Mickiewicz, A. Alexander-Katz, C. A. Ross, and K. K. Berggren, “Complex self-assembled patterns using sparse commensurate templates with locally varying motifs,” Nature Nanotechnology, vol. 5, pp. 256-260, 2010.