Integrated Graphene Interconnects with CMOS
As process technology scales, the importance of material and architectural innovation on interconnect performance will continue to increase. Graphene has attracted much interest as a replacement for copper interconnects due to its large conductivity and high current-carrying capacity [1] [2] [3]. Graphene sheets are also an attractive alternative to carbon nanotube-based interconnects as they are more compatible with conventional lithography methods. This project focuses on integrating high-density graphene devices and characterizing their properties as global interconnects.
In this work, we characterize the performance of monolithically integrated graphene interconnects on a prototype CMOS chip (Figure 1). The test chip implements an array of transmitter/receivers to analyze the end-to-end data communication on graphene wires. Large-area graphene sheets are first grown by chemical vapor deposition [4] and transferred onto the CMOS chip. Subsequent lithography and etch steps were performed to complete the fabrication of graphene wires up to 1 mm in length. Each end of the graphene wire is electrically connected to the underlying transmitter/receiver pair. A low-swing signaling technique is applied, which results in a transmitter energy of 0.3-0.7 pJ/bit/mm, and a total energy of 2.4-5.2 pJ/bit/mm. The low-swing design shows up to 3.3x improvement in energy-delay product over the full-swing design. Bit error rates below 2×10-10 are measured using a 231-1 pseudo-random binary sequence at data rates between 10-25 Mbps. Minimum voltage swings of 100mV at 1.5V supply, and 500mV at 3.3V supply have also been demonstrated. The channel delay of a graphene wire is still an order of magnitude higher than that of a minimum-width CMOS Al wire. The performance of the graphene wire is largely limited by its growth quality and high sheet resistance.
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