Eugene Fitzgerald
Graduate Students
- Yu Bai, Research Assistant, MSE
- Steve Boles, Research Assistant, MSE
- Chengwei Chen, Research Assistant, MSE
- Adam Jandl, Research Assistant, MSE
- Li Yang, Research Assistant, MSE
- Nan Yang, Research Assistant, MSE
- Prithu Sharma, Research Assistant, MSE
Research Scientist
- Dr. Mayank Bulsara
Support Staff
- Gabrielle Joseph
Publications
Self-cleaning and surface recovery with arsine pretreatment in ex situ atomic-layer-deposition of Al<sub>2</sub>O<sub>3</sub> on GaAs, Cheng-Wei Cheng; Hennessy, J.; Antoniadis, D.; Fitzgerald, E.A. Applied Physics Letters, v 95, n 8, p 082106 (3 pp.), 24 Aug. 2009.
Thermal considerations for advanced SOI substrates designed for III-V/Si heterointegration; Yang, N; Bulsara, M.T.; Fitzgerald, E.A.; Liu, W.K.; Lubyshev, D.; Fastenau, J.M.; Wu, Y.; Urteaga, M.; Ha, W.; Bergman, J.; Brar, B.; Drazekd, C.; Daval, N.; Benaissa, L.; Augendre, E.; Hoke, W.E.; LaRoche, J.R.; Herrick, K.J.; Kazior, T.E. 2009 IEEE International SOI Conference, p 2 pp., 2009.
Arrayed Si/SiGe nanowire and heterostructure formations via au-assisted wet chemical etching method; Wang, X. ; Pey, K.L.; Choi, W.K.; Ho, C.K.F.; Fitzgerald, E.; Antoniadis, D. Electrochemical and Solid-State Letters, v 12, n 5, p 37-40, May 2009.
Linearly polarized light emission from InGaN light emitting diode with subwavelength metallic nanograting; Liang Zhang ; Jing Hua Teng; Soo Jin Chua; Fitzgerald, E.A. Applied Physics Letters, v 95, n 26, p 261110 (3).
Growth of highly tensile-strained Ge on relaxed In<sub>x</sub>Ga<sub>1-x</sub>As by metal-organic chemical vapor deposition; Yu Bai ; Lee, K.E.; Chengwei Cheng; Lee, M.L.; Fitzgerald, E.A. Journal of Applied Physics, v 104, n 8, p 084518 (9 pp.), 15 Oct. 2008.
Annihilation of threading dislocations in strain relaxed nano-porous GaN template for high quality GaN growth; Hartono, H. Soh, C.B.; Chua, S.J.; Fitzgerald, E.A. Physica Status Solidi C, v 4, n 7, p 2572-5, June 2007.
In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on GaAs using trimethyaluminum and isopropanol precursors; Cheng, C.-W. ; Fitzgerald, E.A. Applied Physics Letters, v 93, n 3, p 031902-1-3, 21 July 2008
MBE growth of InP-HBT structures on Ge-on-insulator/Si substrates by MBE; Lubyshev, D. ; Fastenau, J.M.; Wu, Y.; Liu, W.K.; Urteaga, M.; Ha, W.; Bergman, J.; Brar, B.; Bulsara, M.T.; Fitzgerald, E.A.; Hoke, W.E.; LaRoche, J.R.; Herrick, K.J.; Kazior, T.E. 2008 IEEE 20th International Conference on Indium Phosphide & Related Materials (IPRM), p 3 pp., 2008.
Alternative slip system activation in lattice-mismatched InP/InGaAs interfaces; Quitoriano, N.J. ; Fitzgerald, E.A. Journal of Applied Physics, v 101, n 7, p 73509-1-10, 1 April 2007.
Monolithic III-V/Si integration; Fitzgerald, E.A. ; Bulsara, M.T.; Bai, Y.; Cheng, C.; Liu, W.K.; Lubyshev, D.; Fastenau, J.M.; Wu, Y.; Urtega, M.; Ha, W.; Bergman, J.; Brar, B.; Drazek, C.; Daval, N.; Letertre, F.; Hoke, W.E.; LaRoche, J.R.; Herrick, K.J.; Kazior, T.E. 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT), p 4 pp., 2008.
Monolithic CMOS-compatible AlGaInP visible LED arrays on silicon on lattice-engineered substrates (SOLES); Chilukuri, K.; Mori, M.J.; Dohrman, C.L.; Fitzgerald, E.A. Semiconductor Science and Technology, v 22, n 2, p 29-34, Feb. 2007.
Fabrication of silicon on lattice-engineered substrate (SOLES) as a platform for monolithic integration of CMOS and optoelectronic devices; Dohrman, C.L. ; Chilukuri, K.; Isaacson, D.M.; Lee, M.L.; Fitzgerald, E.A. Materials Science & Engineering B (Solid-State Materials for Advanced Technology), v 135, n 3, p 235-7, 15 Dec. 2006.
Strained and relaxed SiGe for high-mobility MOSFETs; Lee, M.L. ; Antoniadis, D.A.; Fitzgerald, E.A. 2006 International SiGe Technology and Device Meeting (IEEE Cat. No. 06EX1419), p 158-9, 2006.