Dimitri A. Antoniadis

Collaborators

  • T. Equi, FCRP Materials, Structures, and Devices Focus Center, Executive Director
  • L. Wei, Post-Doctoral Fellow

Graduate Students

  • J. Teherani, Res. Asst., EECS
  • J. Lin, Res. Asst., EECS
  • E. Polyzoeva, Res. Asst., EECS
  • U. Radhakrishna, Res. Asst., EECS

Support Staff

  • W. Rokui, Admin. Asst. II
  • L. McCormick, Admin. Asst. II

Publications

B.S. Ong, K. L. Pey, C. Y. Ong, C. S. Tan, D. A. Antoniadis, and E. E. Fitzgerald, “Comparison between chemical vapor deposited and physical vapor deposited WSi2 metal gate for InGaAs n-metal-oxide-semiconductor field-effect transistors”,  Applied Phys. Lett. 98, 182102 (3 pages), 2011.

J. Lin, T-W. Kim, D. A. Antoniadis, and J. A. del Alamo, “A Self-Aligned InGaAs Quantum-Well MOSFET Fabricated through a Lift-off Free Front-end Process”, Accepted for publication, IEEE Electr. Dev. Lett., 2012.

Y. Liu, M. Luisier, A. Majumdar, D. A. Antoniadis, and M. S. Lundstrom, “On the Interpretation of Ballisitc Injection Velocity in Deeply Scaled MOSFETs”, IEEE Trans. Elcetron Dev. 59, pp. 994-1001, 2012.

L. Wei, O. Mysore, and D. A. Antoniadis, “Virtual-Source Based Self-Consistent Current and Charge FET Models – From Ballistic to Drift-Diffusion Velocity- Saturation Operation”, IEEE, Trans. Electron Dev.,  Vol. 59, pp. 1263-1271, 2012.

M. Luisier, M. Lundstrom, D. A. Antoniadis, and J. Bokor, “Ultimate Device Scaling: Intrinsic Performance Comparisons of Carbon-based, InGaAs, and Si Field-effect Transistors for 5 nm Gate Length”, Proc. International Electron Devices Meeting (IEDM), pp. 11.2.1 – 11.2.4, 2011.

L. Wei and D. A. Antoniadis, “CMOS Device Design and Optimization from a Perspective of Circuit-Level Energy-Delay Optimization “Proc. International Electron Devices Meeting (IEDM), pp. 15.3.1 – 15.3.4 , 2011.

G. Kurian, C. Sun, C-H Owen Chen, J. E. Miller, J. Michel, L. Wei, D. A. Antoniadis, L-S Peh, L. Kimerling, V. Stojanovic and A. Agarwal, “Cross-layer Energy and Performance Evaluation of a Nanophotonic Manycore Processor System using Real Application Workloads “, Proceedings of the IEEE International Parallel and Distributed Processing Symposium, May 2012.