MTL Annual Research Report 2011

Collaborators

• A. Alexander-Katz, MIT
• V. Avant, Photonspot
• M. Bawendi, MIT
• J. Buongiorno, MIT
• I. Chuang, MIT
• M. Csete, U. of Szeged
• E. Dauler, Lincoln Laboratory
• S. Gradecak, MIT
• A.J. Kerman, Lincoln Laboratory
• R.P. Mirin, NIST
• R. Molnar, Lincoln Laboratory
• M. Rooks, Yale
• C.A. Ross, MIT
• H.I. Smith, MIT
• M.J. Stevens, NIST
• E. Thomas, MIT
• A. Vladar, NIST
• F. Wong, MIT
• Y.K.W. Yang, IMRE

Visiting Faculty

• R. Peterson, U. of the South
• S. Warisawaa, U. of Tokyo

Postdoctoral Associates

• F. Marsili, EECS
• A. Mortensen, EECS
• S. Schulz, EECS
• S. Strobel, EECS
• J. Yang, EECS

Graduate Students

• A. McCaughan, Res. Asst., EECS
• C. Herder, Res. Asst., EECS
• M. Snella, EECS
• D. Meyer, Res. Asst., EECS
• F. Najafi, EECS
• S. Nicaise, EECS
• H. Korre, Res. Asst., EECS
• J-B. Chang, Res. Asst., Mat. Sci
• X. Hu, Res. Asst., EECS
• J. Leu, Res. Asst., EECS
• D. Winston, Res. Asst., EECS

Undergraduate Students

• D. Aude, UROP
• V. Ramasesh, UROP
• K. Harry, U. of Kansas
• W. Kalb, UROP
• S. Warnock, UROP

Visiting Students

• F. Bellei, Politecnico di Torino
• A. Tavakkoli, Ntl. U. Of Singapore

Support Staff

• A. Akins, Adm. Assistant
• J. Daley, Project Technician, NSL
• A. Dane, Res. Associate, QNN
• G. Mackay-Smith, Adm. Assistant
• M. Mondol, Facility Manager, SEBL

Publications

Jung, Y.S., J.B. Chang, E. Verploegen, K.K. Berggren, and C. A. Ross, “A Path to Ultranarrow Patterns Using Self-Assembled Lithography,” Nano Letters, vol. 10, pp.1000-1005, 2010.

Yang,  K. W.,Y.S. Jung, J.B. Chang, R.A. Mickiewicz, A.K. Alexander, C.A. Ross, and K. K. Berggren, “Complex self-assembled patterns using sparse commensurate templates with locally varying motifs,” Nature Nanotechnology, vol. 5, pp. 256-260, 2010.

Zhong, T., X. Hu, F.N.C Wong, K. K Berggren, T.D. Roberts, and P. Battle, “High quality fiber-optic polarization entanglement distribution at 1.3µm telecom wavelength,” Optic Letters, vol. 35, pp. 1392-1394, 2010.

Stevens, M.J., B. Baek, E.A. Dauler, A.J. Kerman, R.J. Molnar, S.A. Hamilton, K.K. Berggren, R.P. Mirin, and S.W. Nam, “High-order temporal coherences of chaotic and laser light,” Optic Express, vol. 18, pp. 1430-1437, 2010.

Huigao Duan and Karl K. Berggren, “Directed Self-Assembly at the 10 nm Scale by Using Capillary Force-Induced Nanocohesion,”  Nano Letters, Vol. 10, pp. 3710-3716, 2010.

Mickiewicz, R.A., J. K. W. Yang, A.F. Hannon, Y.S. Jung, A. Alexander-Katz, K. K. Berggren, and C. A. Ross, “Enhancing the potential of block copolymer lithography with polymer self-consistent field theory simulations,” Macromolecules, Vol. 43, No. 19, pp. 8290-8295, 2010.

Duan, H. V.R. Manfrinato, J.K.W. Yang, D. Winston, B.M. Cord, and K.K. Berggren, “Metrology for electron-beam lithography and resist contrast at the sub-10nm scale,” Journal of Vacuum Science and Technology B, Vol. 28, No. 6, pp. H11-H17, 2010.

Strobel, S., C. Kirkendall, J.B Chang, and K.K Berggren, “Sub-10-nm Structures on Silicon by Thermal Dewetting of Platinum,” Nanotechnology, Vol. 21, 2010

Peterson, R.S., K.K. Berggren, and M. Mondol, “The Scanning Electron Microscope as an Accelerator for The Undergraduate Advanced Physics Laboratory,” CAARI 2010: 21st International Conference on the Application of Accelerators in Research and Industry, Denton, TX; AIP.

Wang, S.X., Y.Ge, J. Labaziewicz, E. Dauler, K. K. Berggren and I.L Chuang, “Superconducting microfabricated ion traps,” Applied Physics Letters, Vol. 97, 2010.

Duan, H., D. Winston, J.K.W. Yang, B.M. Cord, V.R. Manfrinato, and K.K. Berggren, “Sub-10-nm Half-Pitch Electron-Beam Lithography by Using PMMA as a Negative Resist,” Journal of Vacuum Science and Technology B, Vol. 28, pp. C6C58-C6C62, 2010.

Korre, H., C.P. Fucetola, J.A Johnson, and K.K Berggren, “Development of a simple, compact, low-cost interference lithography system,” Journal of Vacuum Science and Technology B, Vol. 28, pp. C6Q20, 2010.