From: Sigurd Wagner (wagner@princeton.edu)
Date: Thu Sep 03 1998 - 20:32:31 EDT

Dear colleagues:

I am considering using titanium for machining the electrodes and
showerheads of a
plasma-enhanced CVD system. I wonder how titanium holds up during
periodic cleaning by plasma etching. My favorite etch gas is NF3, but I

also am interested in SF6. Please write if you have any experience.

Sigurd Wagner
Princeton University

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