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Equipment
ICL | TRL | EML | ALL
Integrated Circuits Laboratory (ICL)
Lithography
- Wafer
Steppers
- Photoresist
Coater Developer
- Bake
Oven/Vapor Prime
- Yield
Engineering Systems, Inc., Model 3/10
- Photoresist
Stripper
- Inspection
Microscope
- Scanning Electron Microscope
- Wet
Chemical Process Station (2)
- Semifab
Inc., Model WPS-400
- Wet
Chemical Process Station
- Semifab
Inc., Model WPS-800
Diffusion, Oxidation, and Chemical Vapor
Deposition
- Furnaces
- Thermco
10K 4 Furnace Systems
- (4 atmospheric
tubes, 4 LPCVD)
- Vertical
Thermal Reactor
- Suspended
Loading System
- Heraeus-Amersil,
Inc. SLS-125 Diffusion
- Gas
Cabinets
- Veriflow
Corp. Toxic Gas Delivery Systems
- Wet
Chemical Process Station
- Semifab
Inc. Model WPS-400
- Tube
Cleaner
- Reynolds
Tech
- 6” Horizontal
Quartz Cleaning System
- Toxic
Gas Monitor
- MDA
Scientific, Inc. 16 Multipoint
- Monitoring
Systems
- Rapid
Thermal Annealer
- AG
Associates Heatpulse 410
- AG
Associates 8108
- Surface
Charge Analyzer
Dielectric Deposition
- Dielectric
PECVD System
- Applied
Materials Centura 5300 DCVD
- Dielectric
PECVD System
- Atomic Layer Deposition
- Leak
Detector
- Varian
Turbomolecular 979
- Model
MS-170
- Wet
Chemical Process Station
- Semifab
Inc., Model WPS 400
- Gas
Cabinets
- Veriflow
Corp. Toxic Gas Delivery Systems
- Toxic
Gas Monitor
- MDA
Scientific, Inc., Model 7100
Etching
- Oxide Dry Etch
- Polysilicon/Oxide
Dry Etch
- Polysilicon/Nitride
Dry Etch
- Metal
Dry Etch
- Lam Research Model Rainbow 9600
- Wet
Chemical Process Stations
- Semifab
Inc., Model WPS-400
Metal Deposition
- Electron-Beam
Evaporator
- Temescal
Semiconductor
- Model
VES 2550 Products
- Sputtering
System
Metrology
- Spectroscopic
Ellipsometer
- KLA-Tencor-Prometrix
UV-1280
- Surface
Profilometer
- CV
Plotter
- Materials
Development Corporation
- Model
CSM-16 Advanced Semiconductor
- Automatic
Four-point Probe
- Prometrix
Corporation Omnimap 111B
- Resistivity
Mapping System
- Inspection
Microscope
- E.
Leitz Inc. Ergolux Microscope/
- Camera
System
- Atomic Force Microscope
- Non-contact
profiler
Polishing/Etching
- Chemo-mechanical
Polishing
- Strasbaugh
6EC dielectric CMP
- GnP Poli-400L CMP
- KOH
Wet Etch Station
- Cu-plating
Wet Station
Technology Research Laboratory (TRL)
Lithography
- Mask
Aligners
- Karl
Suss Model MA6
- Electronic
Visions EV620 (two systems)
- Manual
Photoresist Coater Solitec Inc.
- Bake
Ovens
- Wet
Processing Station
- Semifab
Inc. Model WPS 800
- Inspection
Microscope
- Nikon
Nomarski Microscope
- Direct-write Laser System
- Plasma
Resist Stripper
- Photoresist
Stripper
- Wafer
Aligner/Bonder
- Electronic Visions EV620-501
- Measuring
Microscope
Diffusion and Oxidation
- Furnaces
- MRL
Industries Model 718 System
- (7
atmospheric tubes, 1 LPCVD tube)
- Wet
Chemical Process Station
- Semifab
Inc. Model WPS-400
- Rapid
Thermal Annealer
- AG
Associates Heatpulse 210T-02
- AG
Associates Heatpulse 410
Chemical Vapor Deposition
- STS
PECVD
- Carbon Nanotube Deposition
- Cambridge Nano Instruments
- PZT Deposition
Etching
- ICP
Deep Trench Etching System
- ICP
Deep Trench Etching System
- ICP-RIE for III-Vs
- Laser Ablation System
- PECVD
- XeF2 vapor system
- Wet
Chemical Process Station
- Laminaire
Corp. (two systems)
- Toxic
Gas Monitor
- MDA
Scientific, Inc., PSM-8e
- Multipoint
Monitoring System
- Gas
Cabinets
Metal Deposition
- Electron-Beam
Evaporator
- Temescal
Model VES2550
- Temescal Model FC2000
- Sputtering
System
Metrology
- Wafer
curvature measurement system
- Film
thickness Measurement System
- Nanometrics,
Inc. Nanospec, AFT
- Model
L116BLC-26A
- Surface
Profiler
- Sloan
Technology Corp. Dektak IIA
- IV
Characterization
- 2-point
probe station
- Tektronix
486 curve tracer
- Non-contact
profiler
Exploratory Materials Laboratory (EML)
Lithography
- Mask Aligners
- Karl Suss Model MA4
- Karl Suss Model MJB
- Manual Photoresist Coater
- Bake Ovens
- (4) ovens, varying operating temperatures
- Wet Processing Fume Hood
- Inspection Microscopes
- assortment of Nikon Microscopes and others
- Surface Profilometer
- Sloan Technology Corporation Dektak III
- Plasma Asher
Diffusion
- Anneal Tube
- Branson 5” tube allows 600C, inert gases
- Rapid Thermal Annealer
- AG
Associates Heatpulse 410
- Wet Processing Fume Hood
Chemical Vapor Deposition/Etching
- PECVD/RIE (dual chamber)
- Carbon nanotube deposition system
- home-made, acetylene based
- Gas Cabinets
- Toxic Gas Monitor
- MDA Multipoint Monitoring System
- Wet Processing Fume Hood
Metal Deposition
- Electron-Beam Evaporator
- Sputtering System
- Thermal Evaporator
Metrology
- Film thickness Measurement System
- Filmetrics F-20 interferometric system
- Surface Profiler
- Sloan Technology Corp. Dektak IIA
Serving all Fabrication Laboratories:
Inspection and Test
- Spreading
Resistance Probe
- Solid
State Measurements, Inc.
- Model
ASR-100C/2
- Electrical
Measurements
- Hewlett-Packard
Model HP 4062B
- Keithley
Model 450 S
- Probers
Assembly
- Diesaw
- Disco
Abrasive System Model DAD-2H/6T
- Gold
Ball Wire Bonder
- Kulicke
and Soffa Industries Inc., Model 4124