{"id":3581,"date":"2011-07-08T16:10:01","date_gmt":"2011-07-08T16:10:01","guid":{"rendered":"https:\/\/mtlsites.mit.edu\/annual_reports\/2011\/?p=3581"},"modified":"2011-07-19T20:44:36","modified_gmt":"2011-07-19T20:44:36","slug":"templated-solid-state-dewetting-for-pattern-formation-2","status":"publish","type":"post","link":"https:\/\/mtlsites.mit.edu\/annual_reports\/2011\/templated-solid-state-dewetting-for-pattern-formation-2\/","title":{"rendered":"Templated Solid-State Dewetting for Pattern Formation"},"content":{"rendered":"

Vapor deposited thin films are rarely stable, so that when they are heated to temperatures at which atomic diffusivities are sufficiently high, they will dewet to form isolated islands. This liquid-like process, driven by surface energy minimization, can occur well below the film\u2019s melting temperature, so that structure evolution occurs via surface self-diffusion on the solid film.\u00a0 Film dewetting (sometimes called agglomeration) has long been a problem in the processing of micro-systems.\u00a0 Dewetting of silicides, metal films, and even silicon-on-insulator films has been a concern that required careful process control to avoid.\u00a0 At the same time, dewetting has also come to be appreciated as a means of producing catalysts for nanowire and nanotube growth and, increasingly, arrays of more complex structures.<\/p>\n

In the past, we have studied dewetting of polycrystalline to understand the conditions required to avoid dewetting, as well as to develop techniques for control of dewetting to give ordered arrays of catalysts.\u00a0 In recent work, we have studied dewetting of single crystal films, using epitaxial Ni films on MgO as a model system.\u00a0 We found that pre-patterning of the films can be used to reproducibly guide the formation of complex structures.\u00a0 Pattern formation is strongly affected by the size of the patterning relative to the film thickness, and by crystalline anisotropy of the surface energy.\u00a0 Shape evolution is governed by a specific set of fundamental processes that include formation and pinch-off of rims to form wires [1<\/a>] <\/sup>, corner and edge instabilities [2<\/a>] <\/sup>, edge faceting [3<\/a>] <\/sup>, and Rayleigh-like instabilities to form islands from lines [4<\/a>] <\/sup>.\u00a0 Relatively simple pre-patterning can be used to reproducibly form patterns with more complex shapes and smaller feature sizes.<\/p>\n\n\t\t