{"id":2808,"date":"2011-07-19T15:06:25","date_gmt":"2011-07-19T15:06:25","guid":{"rendered":"https:\/\/mtlsites.mit.edu\/annual_reports\/2011\/?p=2808"},"modified":"2011-07-19T15:06:25","modified_gmt":"2011-07-19T15:06:25","slug":"templated-self-assembly-of-block-copolymer-for-high-throughput-sub-10-nm-fabrication","status":"publish","type":"post","link":"https:\/\/mtlsites.mit.edu\/annual_reports\/2011\/templated-self-assembly-of-block-copolymer-for-high-throughput-sub-10-nm-fabrication\/","title":{"rendered":"Templated Self-assembly of Block Copolymer for High Throughput Sub-10-nm Fabrication"},"content":{"rendered":"

Templated self-assembly of block copolymer, based on topographic templates defined by electron-beam lithography (EBL), is an attractive candidate for next generation high-resolution lithography. Templated self-assembly has two advantages compared with other lithography methods: first, the resolution can be scaled down to 5 nm, which cannot be achieved by optical lithography; second, the throughput can be increased by several folds compared with EBL. In our previous study, complex sub-20-nm patterns were fabricated with 45.5 kg\/mol poly(styrene-block<\/em>-dimethylsiloxane) (PS-b<\/em>-PDMS) block copolymer [1<\/a>] <\/sup>.<\/p>\n

Here, we demonstrate high throughput sub-10-nm fabrication by using templated self-assembly of block copolymer. To achieve 10-nm resolution, the dimensions of a block copolymer and a topographic template were scaled down to 10-nm-length scale. We used 16 kg\/mol PS-b<\/em>-PDMS block copolymer, which yields 9-nm half-pitch PDMS cylinders. To control the orientation of 9-nm half-pitch PDMS cylinders, rectangular lattices of posts with height of 19 nm, diameter of 8 nm, and various periods were fabricated and annealed with the block copolymer. As a result, PDMS cylinders formed a long-range ordered region when the post array satisfied the commensurate condition. By varying the periods of posts, a broad range of block copolymer lattice orientation angles was achieved (Figure 1).<\/p>\n

On a lattice with the period larger than 72 nm, PDMS cylinders lost long-range order. To further decrease the density of the posts and therefore increase the throughput without losing long-range order, a sparse lattice of dashes was tested. As a result, a region of well-aligned PDMS cylinders with width of 708 nm was achieved (Figure 2d). The dashes occupy only 1\/66 of the final PDMS line pattern. This result suggests that if instead of writing the complete pattern, EBL is used to create template arrays and the pattern is then completed by a block copolymer, the throughput of EBL could be increased dramatically.<\/p>\n\n\t\t