<\/a>Figure 1: Five layer configurations. Each layer has a different dielectric constant. Different configurations are constructed by different orderings of the five layers. Each configuration is composed of 209 conductors. <\/p><\/div>\n
With the adoption of restricted design rules (RDR) and ultra-regular fabric paradigms for controlling design printability at the 22nm node and beyond, there is an emerging need for a layout-driven, pattern-based parasitic extraction of alternative fabric layouts. Such paradigms impose two requirements of micro- and macro-regularity on the layouts. \u201cMicro-\u201d regularity is achieved by restricting shape edges to lie on a restricted design grid that also imposes stringent directionality on shape orientation. \u201cMacro-\u201d regularity is achieved by using a very restricted set of litho-friendly logic cells. Such regularities have motivated using a relatively small number of optimized (litho-friendly and robust) layouts as building blocks to construct any arbitrary structure. These building blocks will be referred to subsequently as \u201cmotifs.\u201d A designer typically examines different arrangements of the \u201cmotifs\u201d in order to choose the \u201coptimal\u201d (in terms of printability, area, and electrical performance) design. Consequently, from an extraction point of view, there is a need to develop tools that are aware of topological variations.<\/p>\n